Canon and Toshiba have joined the eBeam Initiative, an industry organization supporting the use of electron-beam technology in manufacturing photomasks and producing the master templates needed in nanoimprint lithography. NuFlare Technology reported it will offer a new multi-beam mask-writing machine, the MBM-1000, this year, with deliveries in the fourth quarter of 2017, to help make chips with 5-nanometer dimensions.
Source: Canon debuts Wi-Fi-enabled Rebel T6 DSLR with HD, NFC
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